Pore structure of modified cyclic silsesquioxane thin films made porous using a cyclodextrins-based porogen

Journal of Physical Chemistry B

Volumn 108, Issue 26, 2004, Pages 8953-8959

  Yim, Jin Heong ^a   Baklanov, Mikhail R ^b   Gidley, David W ^c   Peng, Huagen ^c   Jeong, Hyun Dam ^a   Pu, Lyong Sun ^a,d  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b IMEC   (Belgium)

^c UNIVERSITY OF MICHIGAN   (United States)

^d Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLODEXTRIN (CD) MOLECULES; ELLIPSOMETRIC POROSIMETRY (EP); MODIFIED CYCLIC SILESQUIOXANE (MCSSQ) THIN FILMS; POROGEN CONCENTRATION; POSITRONIUM ANNIHILATION LIFETIME SPECTROSCOPY (PALS);

CATALYST ACTIVITY; CHEMICAL MODIFICATION; COATINGS; CONCENTRATION (PROCESS); ELLIPSOMETRY; LSI CIRCUITS; MECHANICAL PROPERTIES; MOLECULAR SPECTROSCOPY; PERMITTIVITY; PORE SIZE; POROSITY; POROUS MATERIALS; POSITRON ANNIHILATION SPECTROSCOPY; REFRACTIVE INDEX; WAVEGUIDES;

THIN FILMS;

EID: 3142733659     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp049738j     Document Type: Article

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