Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 1040-1043

  Awad, Yousef ^a   Lavallée, Eric ^a   Lau, Kien Mun ^a   Beauvais, Jacques ^a   Drouin, Dominique ^a   Cloutier, Melanie ^a   Turcotte, David ^a   Yang, Pan ^a   Kelkar, Prasad ^a  

^a Quantiscript Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATTENUATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON GUNS; EVAPORATION; IMAGE ANALYSIS; MASKS; MICROWAVES; NICKEL PLATING; OPTIMIZATION; REACTIVE ION ETCHING; STRAIN; ULTRATHIN FILMS;

ELECTRON GUN EVAPORATION; IMAGE REVERSAL PROCESS; NANOIMPRINT LITHOGRAPHY; PLASMA DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 3142601606     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1647589     Document Type: Conference Paper

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