Three-dimensional electron-beam lithography using an all-dry resist process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3860-3863

  Babin, S ^a,b   Koops, H W P ^a  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

^b Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010212911     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588682     Document Type: Article

References (14)

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