Electron beam lithography simulation for sub-quarter-micron patterns on superconducting substrates

Superconductor Science and Technology

Volumn 17, Issue 7, 2004, Pages 881-890

  Olzierski, A ^a   Vutova, K ^b   Mladenov, G ^b   Raptis, I ^a   Donchev, T ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

BACK SCATTERED ELECTRONS; BOLTZMAN TRANSPORT EQUATIONS; RESIST FILMS; SUB QUARTER MICRONS;

COMPUTER SIMULATION; DEPOSITION; HIGH TEMPERATURE SUPERCONDUCTORS; MONTE CARLO METHODS; OPTICAL FIBER FABRICATION; PATTERN RECOGNITION; PHOTORESISTORS; SCATTERING; SENSITIVITY ANALYSIS; SIGNAL TO NOISE RATIO; SILICON; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 3142521752     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/17/7/010     Document Type: Article

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