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Volumn 323, Issue 1-2, 1998, Pages 222-226

Numerical modelling of the processes of exposure and development in electron beam lithography on high-temperature superconductor thin films

(3) Gueorguiev, Y a Vutova, K a Mladenov, G a

a INSTITUTE OF ELECTRONICS (Bulgaria)

Author keywords

Electron scattering; Nanostructures; Superconductivity

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; HIGH TEMPERATURE SUPERCONDUCTORS; MATHEMATICAL MODELS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; OXIDE SUPERCONDUCTORS; POLYMETHYL METHACRYLATES; SUPERCONDUCTIVITY;

ELECTRON RESISTS;

SUPERCONDUCTING FILMS;

EID: 0032097583 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)01019-5 Document Type: Article

Times cited : (5)

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