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Volumn 91, Issue 8, 2002, Pages 5411-5418

Ultraviolet light assisted oxygenation process for submicron YBa 2Cu3O7-δ thin film devices

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM RESIST; GRAIN BOUNDARY JUNCTIONS; ION BEAM ETCHING; JUNCTION AREA; NANO-BRIDGES; OXYGEN LOSS; PATTERNING PROCESS; POST-TREATMENT PROCEDURES; RESIST DEVELOPMENT; SAMPLE QUALITY; STRUCTURAL DAMAGES; SUBMICRON; ULTRA-VIOLET LIGHT;

EID: 0037091467     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1459599     Document Type: Article
Times cited : (19)

References (45)
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    • Parratt, L.G.1
  • 26
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    • phc PHYCE6 0921-4534
    • H. Hochmut and M. Lorenz, Physica C 220, 209 (1994). phc PHYCE6 0921-4534
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.