Sub-100 nm lithography and high aspect-ratio masks for fabrication of Josephson devices by ion implantation

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 403-406

  Hollkott, J ^a   Kahlmann, F ^b   Jaekel, C ^a   Hu, S ^a   Spangenberg, B ^a   Kurz, H ^a  

^a UNIVERSITY HOSPITAL RWTH AACHEN   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; HIGH TEMPERATURE SUPERCONDUCTORS; ION IMPLANTATION; LITHOGRAPHY; MASKS; NANOTECHNOLOGY; OXYGEN; SUPERCONDUCTING FILMS; THIN FILMS;

RESISTIVELY SHUNTED JUNCTION MODEL;

JOSEPHSON JUNCTION DEVICES;

EID: 0031685676     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00093-8     Document Type: Article

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