Submicrometer patterning of YBa2Cu3O7-x

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 407-410

  Elsner, H ^a   Ijsselsteijn, R ^a   Morgenroth, W ^a   Roth, H ^a   Meyer, H G ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; IONS; JOSEPHSON JUNCTION DEVICES; LITHOGRAPHY; MULTILAYERS; OXIDE SUPERCONDUCTORS; PLASMA ETCHING;

CARBON/TITANIUM/PMMA TRILAYER;

MASKS;

EID: 0031707690     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00094-X     Document Type: Article

References (7)

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2. H. Elsner Micro System Technologies 91 (1991) 338-343.
3. W. Langheinrich, B. Spangenberg, R. Barth and H. Kurz Microelectronic Engineering 21 (1993) 479-482.
4. R. Barth, B. Spangenberg and H. Kurz Microelectronic Engineering 23 (1994) 381-384.
5. P. Larsson, B. Nilsson, H.R. Yi and Z.G. Ivanov Inst. Phys. Conf. No 148 (1995) 935-938.
6. J. Hollkott, R. Barth, J. Auge. B. Spangenberg, H.G. Roskos and H. Kurz Inst. Phys. Conf. No 148 (1995) 831-834.
7. H. Elsner, R. IJsselsteijn, W. Morgenroth, H. Roth and H.-G. Meyer, EUCAS'97, The Netherlands, to be puplished.