Effect of N 2 plasma on yttrium oxide and yttrium-oxynitride dielectrics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 445-451

  Niu, D ^a,c   Ashcraft, R W ^a   Hinkle, C ^b   Parsons, G N ^a  

^a North Carolina State University   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c Novellas Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY (AES); FILM STRUCTURES; INTERFACIAL LAYERS; PLASMA FILMS;

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; DEPOSITION; DIELECTRIC FILMS; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOISTURE; NITROGEN; OXYGEN; PLASMAS; POLYSILICON; THERMODYNAMICS; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM COMPOUNDS;

MOLECULAR DYNAMICS;

EID: 3142518031     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1666880     Document Type: Article

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