Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2160-2175

  Xu, K ^a,b,c   Vos, R ^a   Vereecke, G ^a   Doumen, G ^a   Fyen, W ^a   Mertens, P W ^a   Heyns, M M ^a   Vinckier, C ^b   Fransaer, J ^b   Kovacs, F ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c SEZ AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CLEANING; CONTAMINATION; HYDRODYNAMICS; LUBRICATION; PH EFFECTS; SCRUBBERS;

BRUSH SCRUBBING; NANO-SIZED PARTICLES; PARTICLE REMOVAL EFFICIENCY (PRE); WAFER SURFACE;

NANOSTRUCTURED MATERIALS;

EID: 31344458776     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2052713     Document Type: Article

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