Tribological attributes of post-CMP brush scrubbing

Journal of the Electrochemical Society

Volumn 151, Issue 7, 2004, Pages

  Philipossian, A ^a   Mustapha, L ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; FRICTION; GELATION; HYDRODYNAMICS; INTERFACES (MATERIALS); KINEMATICS; LUBRICATION; MONOMERS; NOZZLES; PROTONS; SENSORS; SILICA; SOLUTIONS;

BRUSH SCRUBBING; CHEMICAL MECHANICAL PLANARIZATION (CMP); COEFFICIENT OF FRICTION (COF); TRIBOLOGICAL ATTRIBUTES;

TRIBOLOGY;

EID: 3242707987     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1753586     Document Type: Article

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