A theoretical analysis of brush scrubbing following chemical mechanical polishing

Journal of the Electrochemical Society

Volumn 150, Issue 2, 2003, Pages

  Burdick, G M ^a   Berman, N S ^a   Beaudoin, S P ^a  

^a Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL MECHANICAL POLISHING; HYDRODYNAMICS; INTEGRATED CIRCUIT MANUFACTURE; REYNOLDS NUMBER; SILICA; SILICON WAFERS; SURFACE ROUGHNESS;

BRUSH SCRUBBERS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0037324098     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1534098     Document Type: Article

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