Relation between particle density and haze on a wafer: A new approach to measuring nano-sized particles

Solid State Phenomena

Volumn 92, Issue , 2003, Pages 161-164

  Xu, K ^a   Vos, R ^a   Vereecke, G ^a   Lux, M ^a   Fyen, W ^a   Holsteyns, F ^a   Kenis, K ^a   Mertens, P W ^a   Heyns, M M ^a   Vinckier, C ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Contamination; Haze; LPD

Indexed keywords

CONCENTRATION (PROCESS); CONTAMINATION; LIGHT SCATTERING; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; POINT DEFECTS; REFRACTIVE INDEX; SUBSTRATES; SURFACES; PARTICLE SIZE; SILICA; SILICON OXIDES;

HAZE; LIGHT POINT DEFECT; PARTICLE DENSITY; LIGHT POINT DEFECTS; NANO-SIZED PARTICLES; PARTICLE CONCENTRATIONS; PARTICLE DENSITIES; PARTICLE MATERIALS; PARTICLE SURFACE; STATE OF THE ART;

SILICON WAFERS;

EID: 0038068831     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.92.161     Document Type: Conference Paper

References (8)

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