Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICP

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1514-1519

  Nakagawa, H ^a,b   Morishita, S ^a   Noda, S ^a   Okigawa, M ^a   Inoue, M ^a   Sekine, M ^a   Ito, K ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000604558     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581845     Document Type: Review

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