Photoresist erosion studied in an inductively coupled plasma reactor employing CHF3

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1998-2005

  Doemling, M F ^a   Rueger, N R ^a   Oehrlein, G S ^a   Cook, J M ^b  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001104790     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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