Optimization of plasma polymerized methylsilane process for 248 and 193 nm lithography applications

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 349-352

  Monget, C ^a   Fuard, D ^a   Joubert, O ^a   Panabiere J P ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL FILMS; PHOTOSENSITIVITY; PLASMA POLYMERIZATION; SILANES;

PLASMA POLYMERIZED METHYLSILANE (PPMS);

PHOTORESISTS;

EID: 0033130739     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00101-X     Document Type: Article

References (4)

1. 1. C. Monget, C. Lee, O. Joubert, G. Amblard, T. W. Weidman, D. Sugiarto, J. Yang, F. Cormont and R. L. Inglebert, Proc. SPIE, 3333, 366 (1998).
2. 2. C. Lee, S. Das, J. Yang, T. W. Weidman, D. Sugiarto, M. Nault, D. Mui,and Z. Osborne, Proc. SPIE, 3333, 625 (1998).
3. 3. C. Nelson, S. C. Palmateer, T. Lyszczarz, Proc. SPIE, 3332, 19 (1998).
4. 4. O. Joubert, A. M. Joshi, T. W. Weidman, J. T. C. Lee, G. N. Taylor, Proc. SPIE, 2195, 358 (1994).