Importance of evaporation in the design of materials for step and flash imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 4, 2005, Pages 1515-1520

  Kim, Eui Kyoon ^a   Ekerdt, John G ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLYCOLS; LITHOGRAPHY; THROUGHPUT; VAPORIZATION; VISCOSITY;

EVAPORATION RATE; PRODUCTION TOOLS; VOLATILITY;

EVAPORATION;

EID: 31144438260     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1990162     Document Type: Article

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