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Volumn 5374, Issue PART 2, 2004, Pages 1006-1016

Evaluation of the imprio 100 step and flash imprint lithography tool

Author keywords

Imprio 100; S FIL; Step and Flash Imprint Lithography; Template

Indexed keywords

CURING; ETCHING; MONOMERS; OPTICAL DEVICES; PHOTONS; SEMICONDUCTOR MATERIALS; SPIN COATING; VISCOSITY;

EID: 3843092679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537380     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 3
    • 0036643633 scopus 로고    scopus 로고
    • Multiple imprinting in UV based nanoimprint lithography: Related materials issues
    • M. Bender et al., " Multiple Imprinting in UV based Nanoimprint Lithography: Related Materials Issues," Microelectronic Engineering, 61-62 (2002), pp. 407-413.
    • (2002) Microelectronic Engineering , vol.61-62 , pp. 407-413
    • Bender, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.