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Journal of Electron Spectroscopy and Related Phenomena

Volumn 80, Issue , 1996, Pages 73-76

Synchrotron radiation excited etching of silicon surface studied by velocity distribution measurements of desorbed species

(2) Ohashi, Haruhiko a Shobatake, Kosuke a,b

a INSTITUTE FOR MOLECULAR SCIENCE (Japan)

b NAGOYA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038786212 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/0368-2048(96)02925-8 Document Type: Article

Times cited : (5)

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