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Volumn 47, Issue 2, 2003, Pages 229-231

4H-SiC bipolar junction transistor with high current and power density

Author keywords

BJT; High current; High power; SiC; Temperature dependence

Indexed keywords

CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC LOSSES; SILICON CARBIDE; THERMAL EFFECTS;

EID: 0037290261     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00199-5     Document Type: Conference Paper
Times cited : (16)

References (8)
  • 1
    • 85001714913 scopus 로고    scopus 로고
    • Silicon carbide electronic materials and devices
    • Capano M.A., Trew R.J. Silicon carbide electronic materials and devices. Mat. Res. Soc. Bull. 22(3):1997;19-56.
    • (1997) Mat. Res. Soc. Bull. , vol.22 , Issue.3 , pp. 19-56
    • Capano, M.A.1    Trew, R.J.2
  • 5
    • 0035279392 scopus 로고    scopus 로고
    • An implanted-emitter 4H-SiC bipolar transistor with high current gain
    • Tang Y., Fedison J.B., Chow T.P. An implanted-emitter 4H-SiC bipolar transistor with high current gain. Electron Dev. Lett. 22(3):2001;119-120.
    • (2001) Electron Dev. Lett. , vol.22 , Issue.3 , pp. 119-120
    • Tang, Y.1    Fedison, J.B.2    Chow, T.P.3
  • 6
    • 0036160794 scopus 로고    scopus 로고
    • High voltage implanted emitter 4H-SiC BJTs
    • Tang Y., Fedison J.B., Chow T.P. High voltage implanted emitter 4H-SiC BJTs. Electron Dev. Lett. 23(1):2002;16-18.
    • (2002) Electron Dev. Lett. , vol.23 , Issue.1 , pp. 16-18
    • Tang, Y.1    Fedison, J.B.2    Chow, T.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.