A combinative technique to fabricate hot embossing master for PMMA tunneling sensors

Microsystem Technologies

Volumn 10, Issue 4, 2004, Pages 329-333

  Wang, J ^a   Xue, W ^a   Cui, T ^a  

^a LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; ETCHING; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; SILICA; SILICON WAFERS; TRANSDUCERS; X RAY LITHOGRAPHY;

DEFLECTION VOLTAGES; HOT EMBOSSING PROCESSES; MICROFABRICATION; SILICON MASTERS;

SENSORS;

EID: 3042684302     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-003-0336-5     Document Type: Article

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