ANKA - A synchrotron light source for X-ray based micromachining

Microsystem Technologies

Volumn 6, Issue 3, 2000, Pages 113-116

  Gottert J ^a   Moser, H O ^a   Pantenburg, F J ^a   Saile, V ^a   Steininger, R ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042783260     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050010     Document Type: Article

References (13)

1. Babayan R; Buth G; Doyle S; Einfeld D; Gies A; Göttert J; Hagelstein M; Hagestedt A; Hermle S; Holstein F; Huttel E; Jäkel M; Knoch H; Krüssel A; Lange M; Mathis Y-L; Mexner W; Moser HO; Pellegrin E; Perez F; Plesko M; Pont M; Rathjen E; Ristau U; Rossmanith R; Schieler H; Simon R; Spannagel G; Steininger R; Voigt S; Walther R (1999) Status of the 2.5 GeV light source ANKA, PAC'99, New York, to be published
2. Einfeld D; Bach H; Hertel N; Møller SP; Nielsen BR; Ristau U (1999) Status of the injector system for the synchrotron light source ANKA, PAC'99, New York, to be published
3. Einfeld D; Fabris A; Pasotti C; Perez F; Svandrlik M; Voigt S (1999) Status of the rf system for the ANKA storage ring, PAC'99 New York, to be published
4. For more information see the ANKA webpage at www.fzk.de/ anka/english/welcome.html
5. Becker EW; Ehrfeld W; Hagmann P; Maner A; Münchmeyer D (1986) Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic molding. Microelectron Eng 4: 35-56
6. Friedrich C; Bacher W; Bauer W; Coane P; Göttert J; Hanemann T; Haußelt J; Heckele M; Knitter R; Mohr J; Piotter V; Ritzhaupt-Kleissl H-J; Ruprecht R; Warrington R (1997) High Aspect Ratio Processing, in: P. Rai-Choudhury (Ed.) Handbook of Microlithography, Micromachining and Microfabrication, 2: 299-377
7. For more information about the IMT services visit the IMT webpage at www.fzk.de/imt/eimt.htm
8. Saile V (1999) Research and development in high aspect ratio microstructure technology at Forschungszentrum Karlsruhe. Proc HARMST99, Chiba, Japan
9. Megtert S; Pantenburg FJ; Achenbach S; Kupka R; Mohr J; Roulliay M (1999) Preliminary results on the use of mirrors for LIGA process. Proc SPIE 3680: 917-923
10. Pantenburg FJ; Megtert S; Achenbach S; Kupka R; Mohr J; Roulliay M (1999) Improved adhesion of deep X-ray lithography resist structures by using a mirror system. Proc HARMST99, Chiba, Japan
11. More technical information is available from Oxford Instruments "Synchrotron Detectors & Endstations Catalogue 1998/1999" or from the webpage www.oxford-instruments.com/atg/
12. More information on equipment for the LIGA process is available from Jenoptik's webpage at www.jo-mikrotechnik.com//english/index.html.
13. Gullikson E "X-ray interactions with matter" at www-cxro.lbl.gov/optical_constants/