Geometry effect on impurity incorporation and grain growth in narrow copper lines

Journal of the Electrochemical Society

Volumn 152, Issue 12, 2005, Pages

  Zhang, W ^a,b   Brongersma, S H ^a   Heylen, N ^a   Beyer, G ^a   Vandervorst, W ^a,b   Maex, K ^a,b  

^a IMEC   (Belgium)

^b Katholieke Universiteit Leuven   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; CONCENTRATION (PROCESS); ELECTRIC CONDUCTIVITY; GRAIN GROWTH; SECONDARY ION MASS SPECTROMETRY; SULFUR;

COPPER LINES; GEOMETRY EFFECTS;

COPPER;

EID: 30344486307     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2109507     Document Type: Article

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