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Physical Review B - Condensed Matter and Materials Physics

Volumn 72, Issue 19, 2005, Pages

Simultaneous etching and oxidation of vicinal Si(100) surfaces: Atomistic lattice-gas modeling of morphological evolution

(4) Albao, Marvin A a,b Liu, Da Jiang a Gordon, Mark S a,b Evans, J W a,b

a IOWA STATE UNIVERSITY (United States)

b IOWA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 29744470892 PISSN: 10980121 EISSN: 1550235X Source Type: Journal
DOI: 10.1103/PhysRevB.72.195420 Document Type: Article

Times cited : (9)

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