Transition from island growth to step-flow growth for si/si(100) epitaxy

Physical Review Letters

Volumn 78, Issue 11, 1997, Pages 2164-2167

  Voigtländer, Bert ^a   Weber, Thomas ^a   Šmilauer, Pavel ^a   Wolf, Dietrich E ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043224031     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.78.2164     Document Type: Article

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