Slow trap response of zirconium dioxide thin films on silicon

Applied Physics Letters

Volumn 83, Issue 7, 2003, Pages 1400-1402

  Harasek, S ^a   Lugstein, A ^a   Wanzenboeck, H D ^a   Bertagnolli, E ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON; ZIRCONIUM COMPOUNDS;

TRAP ENERGIES;

THIN FILMS;

EID: 0042919569     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1602577     Document Type: Article

References (10)

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