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Crystal Research and Technology

Volumn 38, Issue 12, 2003, Pages 1047-1051

Studies on zirconium nitride films deposited by reactive magnetron sputtering

(5) Bhuvaneswari, H B b Nithiya Priya, I a Chandramani, R c Rajagopal Reddy, V b Mohan Rao, G a

a INDIAN INSTITUTE OF SCIENCE (India)

b UNIVERSITY OF MYSORE (India)

c BANGALORE UNIVERSITY (India)

Author keywords

Dc reactive magnetron sputtering; Electrical resistivity; Optical constants; Zirconium nitride silicon thin films

Indexed keywords

DECORATIVE COATINGS; DIFFUSION BARRIER; ION PLATING;

COATING TECHNIQUES; DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; GLOW DISCHARGES; MAGNETRON SPUTTERING; NITROGEN; PARTIAL PRESSURE; REFRACTIVE INDEX; TITANIUM NITRIDE; ZIRCONIUM COMPOUNDS;

SEMICONDUCTING FILMS;

EID: 0348233415 PISSN: 02321300 EISSN: None Source Type: Journal
DOI: 10.1002/crat.200310134 Document Type: Article

Times cited : (22)

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