SCOPUS 정보 검색 플랫폼

Volumn 91, Issue 11, 2002, Pages 9214-9217

Mechanism for Ohmic contact formation of Ti on n-type GaN investigated using synchrotron radiation photoemission spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

AS ANNEALING; ATOMIC COMPOSITIONS; IN-SITU; N VACANCY; OHMIC CONTACT FORMATION; SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

ELECTRIC CONTACTORS; GALLIUM NITRIDE; OHMIC CONTACTS; TITANIUM; TITANIUM NITRIDE; WORK FUNCTION;

SYNCHROTRON RADIATION;

EID: 0036607903 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1476085 Document Type: Article

Times cited : (56)

References (11)

1
- 0035087099
- jvb JVTBD9 0734-211X
- N. A. Papanicolaou, M. V. Rao, J. Mittereder, and W. T. Anderson, J. Vac. Sci. Technol. B 19, 261 (2001). jvb JVTBD9 0734-211X
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 261
- Papanicolaou, N.A.¹ Rao, M.V.² Mittereder, J.³ Anderson, W.T.⁴

2
- 0035356768
- jaJAPIAU 0021-8979
- D.-F. Wang, F. Shiwei, C. Lu, A. Motayed, M. Jah, S. N. Mohammad, K. A. Jones, and L. Salamanca-Riba, J. Appl. Phys. 89, 6214 (2001). jap JAPIAU 0021-8979
- (2001) J. Appl. Phys. , vol.89 , pp. 6214
- Wang, D.-F.¹ Shiwei, F.² Lu, C.³ Motayed, A.⁴ Jah, M.⁵ Mohammad, S.N.⁶ Jones, K.A.⁷ Salamanca-Riba, L.⁸

3
- 0035832924
- apl APPLAB 0003-6951
- Z. M. Zaho, R. L. Jiang, P. Chen, D. J. Xi, H. Q. Yu, B. Shen, R. Zhang, Y. Shi, S. L. Gu, and Y. D. Zheng, Appl. Phys. Lett. 79, 218 (2001). apl APPLAB 0003-6951
- (2001) Appl. Phys. Lett. , vol.79 , pp. 218
- Zaho, Z.M.¹ Jiang, R.L.² Chen, P.³ Xi, D.J.⁴ Yu, H.Q.⁵ Shen, B.⁶ Zhang, R.⁷ Shi, Y.⁸ Gu, S.L.⁹ Zheng, Y.D.¹⁰

4
- 0042418477
- apl APPLAB 0003-6951
- S.-H. Lim, J. Washburn, Z. Liliental-Weber, and D. Qiao, Appl. Phys. Lett. 78, 3797 (2001). apl APPLAB 0003-6951
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3797
- Lim, S.-H.¹ Washburn, J.² Liliental-Weber, Z.³ Qiao, D.⁴

5
- 0001017612
- apl APPLAB 0003-6951
- D.-W. Kim and H. K. Baik, Appl. Phys. Lett. 77, 1011 (2000). apl APPLAB 0003-6951
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1011
- Kim, D.-W.¹ Baik, H.K.²

6
- 0001246773
- apl APPLAB 0003-6951
- B. P. Luther, J. M. DeLucca, S. E. Mohney, and R. F. Karlicek, Jr., Appl. Phys. Lett. 71, 3859 (1997). apl APPLAB 0003-6951
- (1997) Appl. Phys. Lett. , vol.71 , pp. 3859
- Luther, B.P.¹ Delucca, J.M.² Mohney, S.E.³ Karlicek Jr., R.F.⁴

7
- 0000330622
- jaJAPIAU 0021-8979
- C. I. Wu and A. Kahn, J. Appl. Phys. 83, 4249 (1998). jap JAPIAU 0021-8979
- (1998) J. Appl. Phys. , vol.83 , pp. 4249
- Wu, C.I.¹ Kahn, A.²

8
- 0003427392
- Heyden & Son Ltd., London
- D. Briggs, Handbook of X-ray and Ultraviolet Photoelectron Spectroscopy (Heyden & Son Ltd., London, 1978).
- (1978) Handbook of X-ray and Ultraviolet Photoelectron Spectroscopy
- Briggs, D.¹

9
- 0003937665
- Springer-Verlag, Berlin Heidelberg
- D. J. O'Connor, B. A. Sexton, R. St. C. Smart, Surface Analysis Methods in Materials Science (Springer-Verlag, Berlin Heidelberg, 1992).
- (1992) Surface Analysis Methods in Materials Science
- O'Connor, D.J.¹ Sexton, B.A.² St. C Smart, R.³

10
- 0003459529
- Perkin-Elmer Cor, Eden Prairie, MN
- J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer Corp., Eden Prairie, MN, 1992).
- (1992) Handbook of X-ray Photoelectron Spectroscopy
- Moulder, J.F.¹ Stickle, W.F.² Sobol, P.E.³ Bomben, K.D.⁴

11
- 0004226799
- Pergamon, Oxford
- O. Kubaschewski, C. B. Alock, and P. J. Spencer, Materials Thermochemistry (Pergamon, Oxford, 1993).
- (1993) Materials Thermochemistry
- Kubaschewski, O.¹ Alock, C.B.² Spencer, P.J.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.