Improvment crystallinity of SiC films by addition of CF4 in HFCVD

Journal of Crystal Growth

Volumn 267, Issue 1-2, 2004, Pages 173-176

  Wang, Guoju ^a,b   Wang, Bo ^a   Huang, Anping ^a   Zhu, Mankang ^a   Yu, Munan ^a   Yan, Hui ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b LIAOCHENG UNIVERSITY   (China)

Author keywords

A1. Crystallites; A3. Hot filament CVD; B2. SiC

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLIC FILMS; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS;

CRYSTALLITES; HOT FILAMENT CVD; MICROGRAPHS; SIC;

CRYSTALLINE MATERIALS;

EID: 2942668075     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.03.047     Document Type: Article

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