Annealing effects on a-SiC:H and a-SiC:H(F) thin films deposited by PECVD at room temperature

Thin Solid Films

Volumn 261, Issue 1-2, 1995, Pages 192-201

  Kim, Dong S ^a   Lee, Young H ^a  

^a DREXEL UNIVERSITY   (United States)

Author keywords

Chemical vapour deposition; Plasma processing and deposition; Silicon carbide; Surface stress

Indexed keywords

ANNEALING; BONDING; CHEMICAL VAPOR DEPOSITION; CROSSLINKING; HYDROGEN; ION BOMBARDMENT; OPTICAL PROPERTIES; PLASMA APPLICATIONS; SILICON CARBIDE; STRESSES; STRUCTURE (COMPOSITION); THERMAL EFFECTS;

ANNEALING EFFECTS; BONDING STRUCTURE; HYDROGEN CONTENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA PROCESSING; SURFACE STRESS;

THIN FILMS;

EID: 0029322995     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(94)06473-3     Document Type: Article

References (56)

1. Intrinsic stress and mechanical properties of hydrogenated silicon carbide produced by plasma-enhanced chemical vapor deposition
2. Present and future applications of amorphous silicon and its alloys
3. Amorphous and Crystalline Silicon Carbide and Related Materials
4. The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
5. Improvement of adhesion between Si3N4 thin films and polycarbonate substrates by preparation of an interpenetrating layer using microwave plasma enhanced chemical vapor deposition
6. Plasma-Surface Interactions and Processing
7. Properties and Characterization of Amorphous Carbon Films
8. Diamond and Diamond-Like Films and Coatings
9. Advanced electron cyclotron resonance chemical vapor deposition SiC coatings and x-ray mask membranes
10. Effect of rapid thermal annealing on both the stress and the bonding states of a-SiC:H films
11. Stress in a-Si1−xCx:H studied by (n, −n) double crystal diffractometry
12. Standard Practices for Internal Reflection Spectroscopy
13. NMR and IR Studies on Hydrogenated Amorphous Si1-xCxFilms
14. Preparation and characterization of amorphous SiC:H thin films
15. Microvoids in diamond-like amorphous silicon carbide
16. On the differences between a-SiC:H films deposited with and without fluorine
17. Thermal Decomposition of Plasma-Polymerized Organosilicon Thin Films