Plasma studies under polymorphous silicon deposition conditions

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 236-240

  Kharchenko, A V ^a   Suendo, V ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Deposition rate; Plasma diagnostics; Polymorphous silicon; Silicon clusters

Indexed keywords

DEPOSITION; ELLIPSOMETRY; LIGHT SCATTERING; NANOSTRUCTURED MATERIALS; PLASMA DIAGNOSTICS; PRESSURE EFFECTS;

POLYMORPHOUS SILICON;

AMORPHOUS SILICON;

EID: 0037416719     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01188-4     Document Type: Conference Paper

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