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Volumn , Issue , 2005, Pages 175-182

Technology migration technique for designs with strong RET-driven layout restrictions

Author keywords

RDR; Restrictive Design Rules; RET driven layout; Technology migration

Indexed keywords

CONSTRAINT THEORY; INTEGER PROGRAMMING; OPTIMIZATION; PROBLEM SOLVING; TECHNOLOGY TRANSFER;

EID: 29144525528     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1055137.1055172     Document Type: Conference Paper
Times cited : (10)

References (20)
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    • Calligraher: A new layout migration engine based on geometric closeness
    • F. Fang and J. Zhu. Calligraher: a new layout migration engine based on geometric closeness. In Proc. Int. Symp. on Quality Electronic Design, pages 25-30, 2004.
    • (2004) Proc. Int. Symp. on Quality Electronic Design , pp. 25-30
    • Fang, F.1    Zhu, J.2
  • 9
    • 0030651820 scopus 로고    scopus 로고
    • A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation
    • F.-L. Heng, Z. Chen, and G. E. Tellez. A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation. In Proc. Int. Symp. on Physical Design, pages 116-121, 1997.
    • (1997) Proc. Int. Symp. on Physical Design , pp. 116-121
    • Heng, F.-L.1    Chen, Z.2    Tellez, G.E.3
  • 10
    • 29144438287 scopus 로고    scopus 로고
    • Design rule correction system and method. US Patent 6189132B1
    • F.-L. Heng, Z. Chen, G. E. Tellez, J. Cohn, and R. Narayan. Design rule correction system and method. US Patent 6189132B1, 2001.
    • (2001)
    • Heng, F.-L.1    Chen, Z.2    Tellez, G.E.3    Cohn, J.4    Narayan, R.5
  • 11
    • 0034832169 scopus 로고    scopus 로고
    • Application of automated design migration to alternating phase shift mask design
    • F.-L. Heng, L. Liebmann, and J. Lund. Application of automated design migration to alternating phase shift mask design. In Proc. Int. Symp. on Physical Design, pages 38-43, 2001.
    • (2001) Proc. Int. Symp. on Physical Design , pp. 38-43
    • Heng, F.-L.1    Liebmann, L.2    Lund, J.3
  • 15
    • 0038158890 scopus 로고    scopus 로고
    • Layout impact of resolution enhancement techniques: Impediment or opportunity?
    • L. W. Liebmann. Layout impact of resolution enhancement techniques: impediment or opportunity? In Proc. Int. Symp. on Physical Design, pages 110-117, 2003.
    • (2003) Proc. Int. Symp. on Physical Design , pp. 110-117
    • Liebmann, L.W.1
  • 18
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    • A circuit disassembly technique for synthesizing symbolic layouts from mask descriptions
    • September
    • B. Lin and A. R. Newton. A circuit disassembly technique for synthesizing symbolic layouts from mask descriptions. IEEE Trans. on Computer-Aided Design of Integrated Circuits and Systems, 9(9):959-969, September 1990.
    • (1990) IEEE Trans. on Computer-aided Design of Integrated Circuits and Systems , vol.9 , Issue.9 , pp. 959-969
    • Lin, B.1    Newton, A.R.2
  • 19
    • 85013582474 scopus 로고
    • Minplex - A compactor that minimizes the bounding rectangle and individual rectangles in a layout
    • S. L. Lin and J. Allen. Minplex - a compactor that minimizes the bounding rectangle and individual rectangles in a layout. In Proc. Design Automation Conf, pages 123-130, 1986.
    • (1986) Proc. Design Automation Conf , pp. 123-130
    • Lin, S.L.1    Allen, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.