Dense Only Phase Shift Template Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 15-29

  Fritze, M ^a   Tyrrell, B ^a   Mallen, R ^a   Wheeler, B ^a   Rhyins, P ^a   Martin, P ^a  

^a NONE

Author keywords

Cost effective lithography; Dense template lithography; Gratings; Optical RET; Phase shift mask

Indexed keywords

COST EFFECTIVENESS; DIFFRACTION GRATINGS; OPTICAL FILTERS; OPTICAL RESOLVING POWER; PHASE SHIFT; SEMICONDUCTOR MATERIALS;

RESOLUTION ENHANCEMENT TECHNIQUES (RET);

PHOTOLITHOGRAPHY;

EID: 0242693880     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485244     Document Type: Conference Paper

References (14)

1. A. Yen, S.S. Yu, J.H. Chen, C.K. Chen, T.S. Gau, B.J. Lin, J. Vac. Sci. Technol. B 19 (6), pg 2329 (2001)
2. Resolution Enhancement Techniques in Optical Lithography, A.K. Wong, SPIE Press, (2001), pg 27, pg. 93, pg 100
3. M. LaPedus, Semiconductor Business News, Oct 7, 2002
4. R. Merrit, EE Times, Issue 1243, p.1, Nov 4, 2002
5. M. Fritze, B. Tyrrell, Solid State Technology, Feb 2003 Issue, pg. 61
6. H.Y. Liu, L. Karklin, Y.T. Wang, Y.C. Pati, SPIE Vol 3334, pg 2 (1998)
7. 3, 1 (3), pg 229 (Oct 2002)
8. A. Suzuki, K. Saitoh, M. Yoshii, SPIE Vol. 3679, pg. 396 (1999)
9. M.D. Levenson, J.S. Petersen, D. Gerold, C. A. Mack, SPIE Vol. 4186, pg. 395 (2000)
10. 3, 1 (3), pg. 243 (Oct 2002)
11. S. Nakao, A. Nakae, A. Yamaguchi, H. Kimura, and Y. Ohno, Tech. Dig. Int. Electron Devices Meeting, 1996, p. 61.
12. M.D. Levenson, G. Dai, T. Ebihara, SPIE Vol 4889, pg. 1293, (2002)
13. M. Fritze, B. Tyrrell, R. Mallen, B. Wheeler, P. Rhyins, P. Martin, J. Vac. Sci. Technol. B 20 (6), pg 2589 (2002)
14. Y. Gomei, M. Suzuki, Semiconductor International, 7/1/1998