Interfacial reactions in nickel/titanium ohmic contacts to n -type silicon carbide

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2530-2537

  Park, Jae Hyun ^a   Holloway, Paul H ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED STATE; COMPLEX SEQUENCES; INTERFACIAL REACTIONS; TRILAYERS;

AUGER ELECTRON SPECTROSCOPY; ELECTRIC RESISTANCE; OHMIC CONTACTS; SILICON CARBIDE; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

NICKEL;

EID: 29044444866     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2126677     Document Type: Article

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