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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1336-1340

Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma

(2) Vargheese, K D a Rao, G M a

a INDIAN INSTITUTE OF SCIENCE (India)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; PLASMA SOURCES; REFRACTIVE INDEX; SILICON NITRIDE; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

REACTIVE SPUTTERING;

THIN FILMS;

EID: 0035393007 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1371323 Document Type: Article

Times cited : (13)

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