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Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1652-1658

Effects of substrate bias on the reactive sputtered Zr-Al-N diffusion barrier films

(4) Ruan, Jian Long a Huang, Jow Lay a Chen, J S a Lii, Ding Fwu b

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

b CHENG SHIU UNIVERSITY (Taiwan)

Author keywords

Diffusion barrier; Reactive sputtering; Resistivity; Zr Al N films

Indexed keywords

ALUMINUM NITRIDE; COMPOSITION; COMPOSITION EFFECTS; FILMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; SILICON; SPUTTER DEPOSITION; SUBSTRATES; SURFACE TREATMENT; ZIRCONIUM COMPOUNDS;

DEPOSITION RATE; DIFFUSION BARRIER FILMS; REACTIVE SPUTTERING;

DIFFUSION COATINGS;

COATING;

EID: 28844448713 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.106 Document Type: Article

Times cited : (33)

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