Preparation of reactive magnetron sputtered Zr-Al-N films and their properties

Shinku/Journal of the Vacuum Society of Japan

Volumn 45, Issue 6, 2002, Pages 525-527

  Matsunaga, Takashi ^a   Yoshitake, Masaaki ^a   Nosaka, Toshikazu ^a   Okamoto, Akio ^a  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC PROPERTIES; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; METALLIC FILMS; NITROGEN; OPTICAL PROPERTIES; OXIDATION RESISTANCE; PHASE TRANSITIONS; SEMICONDUCTING FILMS; STRUCTURE (COMPOSITION); ZIRCONIUM;

ATOMIC COMPOSITION; ZIRCONIUM-ALUMINUM-NITROGEN FILM;

FILM PREPARATION;

EID: 0036376007     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.45.525     Document Type: Article

References (2)