Effects of aluminum concentration on the oxidation behaviors of reactively sputtered TiAlN films

Journal of the American Ceramic Society

Volumn 82, Issue 3, 1999, Pages 696-704

  Huang, Jow Lay ^a   Shew, Bor Yuan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COMPOSITION EFFECTS; COMPUTATIONAL METHODS; OXIDATION RESISTANCE; POLYCRYSTALLINE MATERIALS; SPUTTERING; STEEL; THERMODYNAMICS; THERMOGRAVIMETRIC ANALYSIS; THERMOOXIDATION; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

HIGH SPEED STEEL; TITANIUM ALUMINUM NITRIDE;

CERAMIC COATINGS;

EID: 0032678401     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb01819.x     Document Type: Article

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