Hydrogen termination of Si(110) surfaces upon wet cleaning revealed by highly resolved scanning tunneling microscopy

Journal of Applied Physics

Volumn 98, Issue 10, 2005, Pages

  Arima, Kenta ^a   Katoh, Jun ^a   Horie, Shinya ^a   Endo, Katsuyoshi ^a   Ono, Tomoya ^a   Sugawa, Shigetoshi ^b   Akahori, Hiroshi ^b   Teramoto, Akinobu ^b   Ohmi, Tadahiro ^b  

^a OSAKA UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SURFACE OXIDES; WET CLEANING;

CLEANING; HYDROGEN; INFRARED SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY;

SILICON;

EID: 28644433396     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2136214     Document Type: Article

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