The effect of biaxial strain on impurity diffusion in Si and SiGe

Materials Science and Engineering: B

Volumn 124-125, Issue SUPPL., 2005, Pages 241-244

  Larsen, Arne Nylandsted ^a   Zangenberg, Nikolaj ^a,b   Fage Pedersen, Jacob ^a,c  

^a AARHUS UNIVERSITY   (Denmark)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

Biaxial strain; Diffusion studies; Molecular beam epitaxy

Indexed keywords

DIFFUSION; MOLECULAR BEAM EPITAXY; STRAIN; TENSILE STRESS;

BIAXIAL STRAIN; DIFFUSION STUDIES;

SILICON COMPOUNDS;

EID: 27944503617     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.08.078     Document Type: Conference Paper

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