Fractional contributions of microscopic diffusion mechanisms for common dopants and self-diffusion in silicon

Journal of Applied Physics

Volumn 85, Issue 9, 1999, Pages 6440-6446

  Ural, Ant ^a   Griffin, Peter B ^a   Plummer, James D ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001180989     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370285     Document Type: Article

References (23)

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