Efficient incorporation of the Ti component with a novel titanium diolate complex in the CVD of Ba1-xSrxTiO3 thin films

Chemical Vapor Deposition

Volumn 10, Issue 2, 2004, Pages 67-69

  Lee, Jong Seung ^a   Hong, Sung Ho ^a   Woo, Kyoungja ^b   Lee, Wan In ^a  

^a Inha University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CHARACTERIZATION; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPLEXATION; LOW TEMPERATURE OPERATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; PYROLYSIS; TITANIUM; TITANIUM COMPOUNDS; VAPORIZATION;

BARIUM STRONTIUM TITANATE; LOW TEMPERATURE DEPOSITION; METHOXY BRIDGES; TITANIUM DIOLATE;

THIN FILMS;

EID: 1942487313     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200304161     Document Type: Article

References (15)

1. S. Ezhilvalavan, T.-Y. Tseng, Mater. Chem. Phys. 2000, 65, 227.
2. H. Horikawa, N. Mikami, T. Makita, J. Tanimura, M. Kataoka, K. Sato, M. Nunoshita, Jpn. J. Appl. Phys. 1993, 32, 4126.
3. G. W. Dietz, M. Schumacher, R. Waser, S. K. Streiffer, C. Basceri, A. Kingon, J. Appl. Phys. 1997, 82, 2359.
4. C. S. Hwang, S. O. Park, H.-J. Cho, C. S. Kang, H.-K. Kang, S. I. Lee, M. Y. Lee, Appl. Phys. Lett. 1995, 67, 2819.
5. D. B. Studebaker, D. A. Neumayer, B. J. Hinds, C. L. Stern, T. J. Marks, Inorg. Chem. 2000, 39, 3148.
6. J.-H. Lee, S.-W. Rhee, J. Mater. Res. 1999, 14, 3988.
7. J.-H. Lee, S.-W. Rhee, J. Electrochem. Soc. 1999, 146, 3783.
8. D.-S. Kil, J.-M. Lee, J.-S. Roh, Chem. Vap. Deposition 2002, 8, 195.
9. I. Levin, R. D. Leapman, D. L. Kaiser, P. C. van Buskirk, S. Bilodeau, R. Carl, Appl. Phys. Lett. 1999, 75, 1299.
10. M. Yamamuka, T. Kawahara, M. Tarutani, T. Horikawa, T. Oomori, K. Ono, J. Appl. Phys. 1999, 86, 1082.
11. S. Stemmer, S. K. Streiffer, N. D. Browing, A. I. Kingon, Appl. Phys. Lett. 1999, 74, 2432.
12. J. S. Matthews, O. Just, B. Obi-Johnson, W. S. Rees, Jr., Chem. Vap. Deposition 2000, 6, 129.
13. K. Woo, W. I. Lee, J. S. Lee, S. O. Kang, Inorg. Chem. 2003, 42, 2378.
14. Y.-S. Min, Y. J. Cho, D. Kim, J.-H. Lee, B. M. Kim, S. K. Lim, I.-K. Lee, W. I. Lee, Chem. Vap. Deposition 2001, 7, 146.
15. S. H. Hong, S. K. Rim, I.-M. Lee, Y.-S. Min, D. Kim, W. I. Lee, Thin Solid Films 2002, 409, 82.