Application of factor analysis in electron spectrometry (AES, XPS) for materials science

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 96, Issue 9, 2005, Pages 972-982

  Baunack, Stefan ^a   Oswald, Steffen ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Auger electron spectrometry; Body implants; Image analysis; Implantation; Photoelectron spectrometry; Principal components analysis; Titanium alloys

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; IMPLANTS (SURGICAL); INFORMATION RETRIEVAL; PRINCIPAL COMPONENT ANALYSIS; REACTION KINETICS; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

BODY IMPLANTS; FACTOR ANALYSIS (FA); SURFACE ANALYSIS;

MATERIALS SCIENCE;

EID: 27144440524     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.101128     Document Type: Article

References (35)

1. M. Ohring: Materials Science of Thin Films, 2 Edition, Academic Press, San Diego (2001).
2. K. Wetzig, C.M. Schneider (Eds.): Metal Based Thin Films for Electronics, Wiley-VCH, Weinheim (2003).
3. D. Brune, R. Hellborg, H.J. Whitlow, O. Hundert (Eds.): Surface Characterization, VCH, Weinheim (1997).
4. D. Briggs, J.T. Grant (Eds.): Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, IM Publications, Chichester, Manchester (2003).
5. J.F. Watts, J. Wolstenholme: An Introduction to Surface Analysis by XPS and AES, John Wiley & Sons, (2003).
6. D.P. Woodruff, T.A. Delchar: Modern techniques of surface science, Cambridge University Press (1994).
7. C.J. Blomfield: J. Electron Spectroscopy Rel. Phen. 143 (2005) 243.
8. rd Edition, J. Wiley & Sons (2002).
9. M. Otto: Chemometrics, Statistics and Computer Application in Analytical Chemistry, VCH, Weinheim (1998).
10. S. Baunack, S. Kúdela, A. John, V. Liebich: Fresen. J. Anal. Chem. 355 (1996) 633.
11. S. Oswald, S. Baunack: Surf. Interface Anal. 25 (1997) 942.
12. S. Baunack: Mikrochim. Acta 133 (2000), 307.
13. R. Reiche, S. Oswald, D. Hofman, J. Thomas, K. Wetzig: Fresen. J. Anal. Chem. 365 (1999) 76.
14. R. Reiche, S. Oswald, K. Wetzig: Appl. Surf. Sci., 179 (2001) 316.
15. S. Baunack, S. Oswald, D. Scharnweber: Surf. Interface Anal. 26 (1998) 471.
16. I. Tsyganov, E. Wieser, W. Matz, A. Mücklich, H. Reuther, M.T. Pham, E. Richter: Thin Solid Films 376 (2000) 188.
17. S. Oswald, I. Zyganow, M.T. Pham, W. Matz, H. Reuther, E. Richter, E. Wieser: Thin Solid Films 310 (1997) 251.
18. E. Wieser, I. Tsyganov, W. Matz, H. Reuther, S. Oswald, T. Pham, E. Richter: Surf. and Coatings Technol. 111 (1999) 103.
19. S. Tougaard: Surf. Interface Anal. 26 (1998) 249.
20. F. Reniers, C. Tewell: J. Electron Spectrosc. Rel. Phenom. 142 (2005) 1.
21. K. Artyushkova, J.E. Fulghum: Surf. Interface Anal. 36 (2004), 1304.
22. S.W. Gaarenstroom: Appl. Surf. Sci. 7 (1981) 7.
23. W.F. Stickle, D.G. Watson: J. Vacuum Sci. Technol. A 10 (1992) 2806.
24. R.A. Gilbert, J.A. Llewellyn, W.E. Swartz, jr., J.W. Palmer: Appl. Spectrosc. 36 (1982) 428.
25. N. Bonnet, C. Colliex, C. Mory, M. Tence: Scanning Microscopy (1988) Suppl. 2351.
26. J.M. Titchmarsh, S. Dumbill: J. Microscopy-Oxford 188 (1997) 224.
27. I.R. Barkshire, P.G. Kenny, I.W. Fletcher, M. Prutton: Ultramicroscopy 63 (1996) 193.
28. M.R. Keenan, P.G. Kotula: Surf. Interface Anal. 36 (2004), 203.
29. PHI Multipak, Physical Electronics Inc., Eden Prairie (USA)
30. CASA XPS, http://www.casaxps.com/
31. MATLAB: The Language of Technical Computing. Mathworks: Natick, MA (USA).
32. C.D. Brown, L. Vegamontoto, P.D. Wentzell: Appl. Spectrosc. 54 (2000) 1055.
33. C.D. Brown, P.D. Wentzell: J. Chemometrics 13 (1999) 133.
34. C. Chemelli: Surf. Interface Anal. 22 (1994) 60.
35. D. Scharnweber, R. Beutner S. Rößler, H. Worch: J. Mat. Sci. - Mat. Med. 13 (2002), 1215.