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Volumn 179, Issue 1-4, 2001, Pages 316-323
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XPS and factor analysis for investigation of sputter-cleaned surfaces of metal (Re, Ir, Cr)-silicon thin films
a
IFW DRESDEN
(Germany)
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Author keywords
Factor analysis; Metal silicon thin films; Silicides; Sputtering artifacts; X ray photoelectron spectroscopy
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Indexed keywords
CHROMIUM COMPOUNDS;
ELECTRIC PROPERTIES;
ELECTRONIC STRUCTURE;
IRIDIUM COMPOUNDS;
RHENIUM COMPOUNDS;
SEMICONDUCTING SILICON COMPOUNDS;
SPUTTERING;
SURFACE CLEANING;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
TRANSPORT PROPERTIES;
X RAY PHOTOELECTRON SPECTROSCOPY;
CHROMIUM SILICIDE;
FACTOR ANALYSIS;
IRIDIUM SILICIDE;
RHENIUM SILICIDE;
SEMICONDUCTING FILMS;
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EID: 0035898757
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(01)00300-2 Document Type: Article |
Times cited : (19)
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References (36)
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