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Volumn 179, Issue 1-4, 2001, Pages 316-323

XPS and factor analysis for investigation of sputter-cleaned surfaces of metal (Re, Ir, Cr)-silicon thin films

Author keywords

Factor analysis; Metal silicon thin films; Silicides; Sputtering artifacts; X ray photoelectron spectroscopy

Indexed keywords

CHROMIUM COMPOUNDS; ELECTRIC PROPERTIES; ELECTRONIC STRUCTURE; IRIDIUM COMPOUNDS; RHENIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SPUTTERING; SURFACE CLEANING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0035898757     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00300-2     Document Type: Article
Times cited : (19)

References (36)
  • 18
    • 0004718627 scopus 로고    scopus 로고
    • PhD Thesis, Technische Universität Dresden, Germany
    • (2000)
    • Reiche, R.1
  • 27
    • 0004679537 scopus 로고    scopus 로고
    • PhD Thesis, Technische Universität Dresden, Germany
    • (1999)
    • Kurt, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.