Morphological changes of the Si [1 0 0] surface after treatment with concentrated and diluted HF

Materials Science in Semiconductor Processing

Volumn 4, Issue 5, 2001, Pages 437-441

  Palermo, V ^a   Jones, D ^a  

^a CNR   (Italy)

Author keywords

Etching; HF; Silicon; STM

Indexed keywords

ETCHING; FOURIER TRANSFORMS; HYDROGEN INORGANIC COMPOUNDS; SCANNING TUNNELING MICROSCOPY;

POWER SPECTRA;

SEMICONDUCTING SILICON;

EID: 0035475108     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(01)00007-5     Document Type: Article

References (17)