Optical vortex masks for via levels

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 2, 2004, Pages 293-304

  Levenson, Marc D ^a   Ebihara, Takeaki ^b   Dai, Grace ^c   Morikawa, Yasutaka ^d   Hayashi, Naoya ^d   Tan, Sze Meng ^e  

^a MD Levenson Consulting   (United States)

^b NEC Corporation of America   (United States)

^c Sigma Cad   (United States)

^d DAI NIPPON PRINTING CO LTD   (Japan)

^e PICARRO INC   (United States)

Author keywords

Contact; Double exposure; Optical vortex; Phase shifting mask; Via

Indexed keywords

DOUBLE EXPOSURE; OPTICAL VORTEX; PHASE-SHIFTING MASK; PRINT CONTACT ARRAYS;

ARRAYS; ELECTRIC CONTACTS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTROMAGNETIC WAVE ATTENUATION; ERROR ANALYSIS; LITHOGRAPHY; OPTICAL PHASE CONJUGATION; PHASE SHIFT; PHOTORESISTS; PROCESS CONTROL; REFRACTIVE INDEX; TOPOLOGY;

MASKS;

EID: 2542480186     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1683304     Document Type: Article

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