Vortex Via Validation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 93-102

  Levenson, Marc D ^a   Ebihara, Takeaki ^b   Morikawa, Yasutaka ^c   Hayashi, Naoya ^c  

^a MD Levenson Consulting   (United States)

^b NEC Corporation of America   (United States)

^c DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Contact; Double Exposure; Optical Vortex; PSM; Via

Indexed keywords

ARRAYS; ATOMIC FORCE MICROSCOPY; COHERENT LIGHT; ERROR ANALYSIS; IMAGING TECHNIQUES; LIGHT SCATTERING; LIGHTING; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; TOPOLOGY;

CONTACT; DOUBLE-EXPOSURE; OPTICAL VORTEX; PSM; VIA;

MASKS;

EID: 1842475833     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.517872     Document Type: Conference Paper

References (12)

1. F. M. Schellenberg. V. Boksha, N. Cobb, J.C. Lai, C. H. Chen & Chris Mack, "Impact of mask errors on full chip error budgets," Proc. SPIE 3679, 261-275 (1999).
2. J. F. Chen, T. Laidig, K. E. Wampler, R. Caldwell, K. H. Nakagawa & A. Liechen, "A practical technology path to sub-0.10 micron process generations via enhanced optical lithography," Proc. SPIE 3173, 995-1016 (1999).
3. K. Suhm, Dan Baker, B. Hess, K. Clark & Scott Coleman, "Contact printing to the 45 nm node using a binary mask and 248 nm lithography," SPIE Proc. 5039, 277-290 (2003).
4. M. D. Levenson, G. Dai and T. (J.) Ebihara, "The vortex mask: Making 80nm contacts with a twist!" SPIE Proc. 4889, 1293-1303 (2002).
5. N. Baba-Ali, H. Sewell & J. Kreuzer, "Overcoming the Resolution Challenge Using Special Illumination Techniques to Print 50/50 nm Nested Contact Holes at 157 nm Wavelength," SPIE Proc. 5040, 1352-1362 (2003).
6. M. Levenson, S. Tan, G. Dai, Y. Morikawi, N. Hayashi, T. Ebihara, "Vortex via process: analysis and mask fabrication for contact CDs <80 nm," SPIE Proc. 5040, 344-370 (2003).
7. Z. S. Sacks, D. Rozas, and G. A. Swartzlander, Jr., "Holographic formation of optical-vortex filaments," J. Opt Soc. Am. B. 15, 2226-2234 (1998), also J. E. Curtis and D. G. Grier, "Structure of Optical Vortices," Phys. Rev. Lett. 90, 133901-1 (2003)
8. Z. S. Sacks, D. Rozas, and G. A. Swartzlander, Jr., "Holographic formation of optical-vortex filaments," J. Opt Soc. Am. B. 15, 2226-2234 (1998), also J. E. Curtis and D. G. Grier, "Structure of Optical Vortices," Phys. Rev. Lett. 90, 133901-1 (2003)
9. C. J. Progler and G. Xiao, "Critical evaluation of photomask needs for competing 65-mn node RET options," SPIE Proc. 5040, 171-181 (2003).
10. T. Ebihara, P. Rhyins, T. Oga, P. Martin & M. Sweiss, "150nm Dense/isolated contact hole study with Canon IDEAL technique," Proc. SPIE 4562, 1068-1076 (2002); also D. J. Gerold, J. S. Petersen, and M. D. Levenson, "Multiple pitch transmission and phase analysis for six types of strong phase-shifting masks, "Proc. SPIE 4346, 729-743 (2001).
11. T. Ebihara, P. Rhyins, T. Oga, P. Martin & M. Sweiss, "150nm Dense/isolated contact hole study with Canon IDEAL technique," Proc. SPIE 4562, 1068-1076 (2002); also D. J. Gerold, J. S. Petersen, and M. D. Levenson, "Multiple pitch transmission and phase analysis for six types of strong phase-shifting masks, "Proc. SPIE 4346, 729-743 (2001).
12. F. Schellenberg, M.D. Levenson & P.J. Brock, "Optimization of real phase mask performance," SPIE Proc. 1604, 274-296 (1991).