Advances in vortex via fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 1237-1246

  Levenson, Marc D ^a   Ebihara, Takeaki ^b   Reilly, Michael ^c   Barclay, George ^c   Vohra, Vaishali ^c   Stafford, Carolyne ^c   Mastovich, Martin E ^d   Morikawa, Yasutaka ^e   Hayashi, Naoya ^e  

^a MD Levenson Consulting   (United States)

^b NEC Corporation of America   (United States)

^c SHIPLEY COMPANY   (United States)

^d Soluris Inc   (United States)

^e DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Arf; Contact; Krf; Optical Vortex; PSM; Via

Indexed keywords

ARF; CONTACT DIAMETER (CD); KRF; OPTICAL VORTEX IMAGES; PHASE SHIFT MASK (PSM);

ABERRATIONS; APPROXIMATION THEORY; ERROR CORRECTION; FOURIER OPTICS; IMAGE PROCESSING; LENSES; NATURAL FREQUENCIES; OPTICAL RESOLVING POWER; PHASE SHIFT;

PHOTOLITHOGRAPHY;

EID: 3843128466     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535652     Document Type: Conference Paper

References (9)

1. J. E. Curtis and D. G. Grier, "Structure of Optical Vortices," PhysRevLett.90.133901 (2003) also Z. S. Sacks, D. Rozas, and G. A. Swartzlander, Jr., "Holographic formation of optical-vortex filaments," J. Opt. Soc. Am. B, Vol. 15, 2226-2234 (1998) and references therein.
2. J. E. Curtis and D. G. Grier, "Structure of Optical Vortices," PhysRevLett.90.133901 (2003) also Z. S. Sacks, D. Rozas, and G. A. Swartzlander, Jr., "Holographic formation of optical-vortex filaments," J. Opt. Soc. Am. B, Vol. 15, 2226-2234 (1998) and references therein.
3. M. D. Levenson, T. (J.) Ebihara, Y. Morikawa, N. Hayashi, and G. Dai, "Vortex Vias: Making sub-100nm contacts with twisted light and negative resist," Proceedings of the Interface '03 Symposium, Sept. 22-23, 2003, Coronado CA published as a CD by Arch Chemicals Inc. /pdf-07 (2003).
4. M. D. Levenson, G. Dai and T. (J.) Ebihara, "The Vortex Mask: Making 80nm Contacts With A Twist!," SPIE 4889, 1293-1303 (2002).
5. M.D. Levenson, S.Z. Tan, G. Dai, Y. Morikawa, N. Hayashi, T. (J.) Ebihara, "The Vortex Via Process: Analysis and Mask Fabrication for Contact CDs < 80nm," SPIE 5040-32, 344-370 (2003).
6. M.D. Levenson, T. (J.) Ebihara, Y. Morikawa and N. Hayashi, "Vortex Via Validation," SPffi 5256-12 (2003).
7. Y. Unno, "Resolution limit for two-dimensional crossed-grating patterns projected by a coherent beam," Applied Optics, Vol. 42, p 3259-3267 (2003).
8. Yasuyuki Unno, private communication, December 2003.
9. th International Conference on Photopolymers, Oct. 20, 2003, Tamiment, PA, USA.