Manufacturing-aware design methodology for assist feature correctness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 131-140

  Gupta, Puneet ^a   Kahng, Andrew B ^a,b   Park, Chul Hong ^b  

^a Blaze DfM   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENCHMARK DESIGNS; CRITICAL DIMENSIONS (CD); SUB-RESOLUTION ASSIST FEATURES (SRAF); SUBWAVELENGTH LITHOGRAPHY;

BENCHMARKING; OPTICAL RESOLVING POWER; POLYSILICON; PRODUCT DESIGN; SEMICONDUCTOR DEVICE MANUFACTURE;

LITHOGRAPHY;

EID: 25144522224     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.604872     Document Type: Conference Paper

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