Understanding the forbidden pitch phenomenon and assist feature placement

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 985-996

  Shi, Xuelong ^a   Hsu, Stephen ^a   Chen, Fung ^a   Hsu, Michael ^a   Socha, Robert J ^a   Dusa, Micea ^a  

^a ASML US Inc   (United States)

Author keywords

EL; Exposure latitude; Forbidden pitch; OPE; Optical proximity effect; SB; Scattering Bar

Indexed keywords

IMAGING TECHNIQUES; LIGHT INTERFERENCE; LIGHT SCATTERING; LIGHTING;

OPTICAL PROXIMITY EFFECTS;

PHOTOLITHOGRAPHY;

EID: 0036030174     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473427     Document Type: Article

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